Supervisory authorities

CNRS

Our partners

Search

Home > Technical Platforms > Technologic platform for photonic integrated circuits (CCLO) > CCLO facilities

CCLO facilities

The platform is constituted by two chemistry rooms and three clean rooms: Class 100, Class 10,000 and Class 100,000 in which we find the following technological equipment:

Chemistry Lab
  • Laminar flow hoods
  • Optical microscope
  • Spin coater
  • Electro-chemical bench
  • Tuned ultrasonic generator
  • Production of deionized water
Characterization of materials
  • Scanning Electron Microscope (Hitachi)
  • Raman Spectrophotometer (Horiba - Jobin Yvon)
  • UV Spectrophotometer - Visible - Near IR (Perkin Elmer)
  • Interferometers (Ocean Optics)
Clean room, class 100
  • Laminar flow hoods
  • Mask aligner (KarlSüss-MJB4)
  • Mask aligner (KarlSüss-MA750)
  • Spin coater (ATM SSE)
  • Hot plates, ovens
  • Interferometer (Ocean Optics)
  • Optical microscope
  • Various equipment (US generators, agitators, precision balance, etc.)
Photolithography
  • Wafer size < 3 inches ; Resolution 0.5 µm
     
Clean rooms, class 10000 and 100000
  • Plasma etching reactor (RIE-ICP, Corial)
  • Sputtering deposition reactor (Plassys)
  • Thermo-oxidation furnace, high temperatures (Nabertherm)
  • Mechanical profilometer (Veeco)
  • Optical microscopes
  • M-lines bench: measurements of refractive indices (Metricon)